Mass Flow Controllers
Compositions
The Mass Flow Controllers (MFCs) in an MPCVD (Microwave Plasma Chemical Vapor Deposition) Machine play a vital role in precisely regulating the flow of process gases. Designed to handle a wide range of gases such as hydrogen, methane, nitrogen, and argon, the MFCs offer exceptional accuracy and control, ensuring consistent and stable gas delivery. With flow rates adjustable from 3 SCCM to 1000 SCCM, these controllers provide high-precision gas management, which is critical for achieving optimal plasma conditions during deposition processes.
Microwave Generator Set
Compositions
The Microwave Generator Set is a core component of the MPCVD (Microwave Plasma Chemical Vapor Deposition) Machine, designed to deliver stable and precise microwave power for efficient plasma generation. Operating at 2.45 GHz, this generator set provides adjustable power output ranging from 3 kW to 75 kW, making it ideal for a wide range of applications such as lab-grown diamond production. Its advanced control systems allow for continuous power adjustment, ensuring uniform plasma conditions critical for high-quality material synthesis.
Pressure Controllers
Compositions
The Pressure Controllers used in MPCVD (Microwave Plasma Chemical Vapor Deposition) Machines are essential for maintaining precise pressure control within the deposition chamber. These controllers ensure a stable and controlled environment, which is critical for achieving consistent and high-quality material synthesis, such as in the production of lab-grown diamonds. With a wide control range from 0.01 to 1000 Torr, these pressure controllers offer excellent accuracy and response time, allowing for real-time adjustments to match process requirements.