Mass Flow Controllers
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The Mass Flow Controllers (MFCs) in an MPCVD (Microwave Plasma Chemical Vapor Deposition) Machine play a vital role in precisely regulating the flow of process gases. Designed to handle a wide range of gases such as hydrogen, methane, nitrogen, and argon, the MFCs offer exceptional accuracy and control, ensuring consistent and stable gas delivery. With flow rates adjustable from 3 SCCM to 1000 SCCM, these controllers provide high-precision gas management, which is critical for achieving optimal plasma conditions during deposition processes.
Equipped with advanced closed-loop feedback systems and PID control, the Mass Flow Controllers guarantee fast response times and excellent repeatability, enabling precise control of gas mixtures and flow rates. The controllers can be easily adjusted either manually or through digital input, with real-time monitoring via integrated displays or remote interfaces. These features make them ideal for maintaining the delicate balance of gases necessary for material synthesis, particularly in the lab-grown diamond industry.
Built with high-quality materials such as 316L stainless steel and equipped with robust safety features, the Mass Flow Controllers are engineered for long-term reliability in demanding environments.
01
FLOW RANGE
• Flow Rate: 3 SCCM to 1000 SCCM (Standard Liters Per Minute), depending on the gas type
• Flow Control Range: 0.5% to 100% of Full Scale
• Gas Types: H₂, CH₄, N₂, O₂, Ar, He, Customizable for Other Gases
02
ACCURACY & REPEATABILITY
• Accuracy: ±1% of Reading or ±0.5% Full Scale
• Repeatability: ±0.2% of Full Scale
• Response Time: ≤ 300 ms
03
Operating Pressure
• Pressure Range: 20 – 50 psi
• Pressure Sensitivity: ±0.15% of Reading per psi
04
Temperature Specifications
• Operating Temperature: 0°C to 50°C
• Storage Temperature: -20°C to 70°C
• Temperature Sensitivity: ±0.01% of Full Scale per °C